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1 article(s) from de Araujo, Eduardo Nery Duarte

Effects of post-lithography cleaning on the yield and performance of CVD graphene-based devices

Eduardo Nery Duarte de Araujo,
Thiago Alonso Stephan Lacerda de Sousa,
Luciano de Moura Guimarães and
Flavio Plentz

Beilstein J. Nanotechnol. 2019, 10, 349–355, doi:10.3762/bjnano.10.34

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Figure 1: First photolithography step for the definition of the graphene structure: a) photoresist coating on...

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Figure 2: Procedures P1 and P2 for photoresist removal and lift-off. Procedure P1: (a, b) The LOR/resist laye...

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Figure 3: Raman spectra of CVD graphene devices (from top to bottom): graphene as-received; graphene device f...

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Figure 4: Size of well-ordered domains (L_a) for CVD graphene (as-received), for graphene devices fabricated b...

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Figure 5: Conductivity σ as a function of the gate voltage V_g for graphene devices fabricated by procedures P...

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Figure 6: Hole-mobility values of graphene devices fabricated by different procedures, P1 and P2, and by diff...

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Published 05 Feb 2019

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